簡易操作マニュアル2
Contents
1. 2 3 MSDS Material Safety Data Sheet2. Y 2 7 2 2 ESIAPCI P N 380 1635 P N 380 1584 2 2 8 5 3 md 2 9 ESI 6 X
3. MicroESI NanoESI AUX AUX 2 1 ESI AUX AP1
4. MS 1 LC 2 Control Panel AUX Gas Heater On Off AUX EE AU Gas Heater Onjoff AUX 3 NanoFrontier eLD Standby Control Panel System Status Instrument Status Standby AUX 15L min 15 AUX Control Panel AUX 40 AUX 40 NanoFrontier eLD Off AUX 40 Off 40 A PA EV ESN 40 5 NanoErontier eLD Off
5. 2 1 APCI AUX AP1 MS 2 1 ESIAPCI 2 1 3 ESVAPCI a b g AUX
6. AUX Gas ESI 8 0 13 0 L min APCI 3 0 10 0 L min e AUX Gas Temperature AUX Gas 350 600 C Needle Spray Potential ESI APCI 3000 5000 V g AP1 Temperature 140 C 2 3 2 3 2 NanoFrontier eLD 8 6 1 2 5mL min P N 380 1668 F P N 380 3468
7. a b 1 10 15 2 3 2 3 1 Control Panel Control Panel 1 System Status 5ystem Status Instrument Status IaN System Status ok a Instrument Mode TOF a lanization Type Semi Micro15 Lens Setting itivi Electron Curen ua oooo Vacuum Status ok Hv Status on AP1Temperature C 16Q0 AP2 Temperature C 148 b Nebuizer Gas Flow L min 30 CounterGas Flow L min po c AUXGas Flow L min 8 0 AUX Gas Tamperatue E B01 Interface Pressure Pa 1 32e 002 DTOF Pressure Pal 2 56e 005 Syinge Pump
8. ESI APCI 2 2 ESI APCI 2 2 ESI APCI 2 2 1 ESI LC MS OFF ESI 1 NanoFrontier eLD Instrument Status OFF Shut AUX ESI 2 6 3
9. 139 Y 2 10 2 2 ESI APCI P N 380 1635 P N 380 1584 2 2 11 5 AUX
10. X Y AUX 2 12 6 NanoFrontier eLD Standby Control Panel System Status Instrument Status Standby 7 NanoFrontier eLD 2 3 1 Control Panel 8 LC LC 2 3 8 Semi Micro LC System 2 2 ESI APCI 9 NanoFrontier eLD ON Control Panel System Status Tnstrument Status ON 10 Control Panel AUX Gas Heater On Off
11. Control Panel Tnstrument Status Off 4 System Status 6 2 3 2 3 70 C a b c
12. Needle Down Speed Fast Syringe Speed 3 Syringe Volume mL li lt lee00n Sense Missing Vial Hack Number Max Position of Vial MS Wash Stokes WashPonl 3 Wash Speed WashPot 4 lt _ i Needle Wash Time 1 T Delecloi rm Time Tergeretie 10 Stop Timg Im 3000 Toleercel C 5 Hpsponse s 1 Samplq Perigd ms Dyen ER 40 Absorbance Tempersture 5D utoZerc Belore riection May imit Temoerawrel 0 fset AUl 660 Tolrancer fn Pclariy ET yait Timeirmin EO Rarge andsd r Wes i Close 2 22 Method Setting Conditioning Conditioning Pump On Ready Conditioning Pump Autosampler Pump ON PumprHFF Detector 1 ven Heaster ON L D2 Lamp BFF M at Log Infomalion La Eneay 2 23 Conditioning 2 3 2 3 4 Auto Sequence 2 3 2
13. c b IS2 e Y HV IS1 Ss p k AUX d X m nm 2 3 1 a b c d X XX e Y Y g AUX AUX AC200V IS2
14. MS 2 1 2 APCI APCI APCI AUX AP1 2C 2 APCI APCI MicroESI NanoESI MicroESI NanoESI AUX 2 2 2 1 ESIAPCI AUX
15. 2 13 System Status a Ionization Type Semi Micro 1S b Nebulizer as Flow Nebulizer Gas c AUX Gas Flow AUX Gas Temperature AUX Gas 2 3 2 Instrument Setting Ionization AP Lens lonization AP Lens Weas bens tae lon Trap QPole Lens TOF 1 SM File Setting Informalion b nnizahion APLens Instrument Mode TOF EwPoeniaM i 4 p Mea yrawwewero rm 2 14 Instrument Settings re AP1 Lens a Ionization Type Semi Micro IS b Nebulizer Gas Flow Nebulizer Gas a 2 0 38 5 L min c Counter Gas Flow d AUX Gas Flow
16. MS 1 Auto Sequence Control Panel Semi Micro LC System 2 3 2 b LC LC 2 NanoFrontier eLD ce 1 Rsserpine100pg OO CNanoFrontieriTrapTofueLD_TestBICISemiSystemTest msm 3 2 MReserpnetopg eSerpne1ppb 12000 1CWanoFrortierTrapTofeLD_TestMBICISemiSystemTestmsm 2 24 1 a Data File Name b Sample ID c Acquisition Duration MS Setting msm msm Duration 2 3 d MS Settings MS Control Panel Method Method
17. Apply Settings Instrument Shut vw Instrument Qff Instrument Standby Instrument On Acquisition On Acquisition OFF Gystern Settings 2 18 System Settings System Settings Syringe Pump Syringe Volume Syringe Diameter 2500 nL 7 284 mm Sysiem Setiinps Syringe Volume ul Iso Syringe Diameter mm EL EE Comments _ 2 19 System Settings 3 50L min 2 3 5 SI APCI ESI a TBA Tetrabuthylammonium 12 5g L Reserpine 25pg
18. dl AUX ON AUX 11 LC 12 AP1 1mm AP1 2 2 ESI APCI 2 2 3 AUX 600 C AUX 1 AP1 200 NanoFrontier eLD Instrument Status Off 1
19. AP1 7 AP1 8 NanoFrontier eLD Standby Control Panel System Status Tnstrument Status Standby 9 NanoFrontier eLD 2 3 1 Control Panel 2 2 ESI APCI 10 LC LC 2 3 3 Semi Micro LC System 11 NanoFrontier eLD ON Control Panel System Status Tnstrument Status ON 1 Control Panel AUX Gas Heater On Off AUX ON
20. AUX 12 LC 2 2 ESI APCI 2 2 2 APCI LC MS OFF APCI 2 NanoFrontier eLD Instrument Status OFF Shut 3 AUX APCI
21. AC200V x AUX AUX 53 T vw 2 1 ESI APCI w APCI x ON OFFE Off z y APCI ESD 2 5 3 y ESI APCI
22. Ultramark 1621 2 5mg L 4 200g 1mg Ultramark 1621 5mg L NanoFrontier eLD 3 5 LC lt ESI gt Reserpine 10ug L 609 2812 lt APCI gt Testosterone50gL 289 2 LC LC ESI APCI 200g L min 1gL 1 2 2 3 2 3 3 Semi Micro LC S
23. HV ESI APCI G IS1 k LO 2 4 2 1 ESIAPCI AUX AUX m nm o p q AUX u AUX y x ON OFT 90 3 RE 2 4 2 q AUX AUX
24. NanoFrontier eLD APCI 3 0 10 0 L min Ns 3 LC Settings C WanoFrorntier SemilicroLC SamiMicroMethodiSaimle mmth_ C WanoFrorntier SemiMicroLCISemiMicroMethod Saimple mrth 2 25 2 e LC Settings LC 2 9 3 mmth Comments g Vial Number h Injection Volume 0 3 2 2 1 2 2 2 4 Auto Sequence
25. 2 F P N 380 1841 NanoFrontier eLD 3 6 P N 380 1668 F P N 380 3468 2 15 F 2 Control Panel Instrument Setting Syringe Pump Infuse Rate nL mim 10 lonization AP Lens Octapole Lens Trap Lens ECD Lens lon Trap QPole Lens TOF SWinge Pump Syinge Pump Infuse Fate uL min 10 2 16 Syringe Pump Control Panel Current Infuse Rate is 5 0 Syringe Diameter Should be set between 2 304 and 7 283 2 3 Instrument Status Of Control Panel Instrument System Settings
26. 2 1 ESIAPCI 2 ESI APCI 8 OFF 2 1 ESTI APCI 2 2 ESI APCI 2 3 2 1 ESI APCI 2 1 1 ESI ESRI ESI AUX AP1 1 ESI 2 1 ESUAPCI ESI MicroESI NanoESI
27. ystem LC Semi Micro LC System 1 Semi Micro LC System 4 Semi Micro LC System 1 Auto Sequence 2 Semi Micro LC System Auto Sequence LC BemiMicro connect Semi Micro LC System LC i gs oo Fe wc nm ol oe 2 21 Semi Micro LC System 2 3 Method Setting 3 Method Setting Bave Bave amp Apply mmth Method Setting
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