Sputter Coater (Polaron)
Contents
1. A NANO RESEARCH F AC E Sputter Coater Polaron User Manual 24 Edition Sept 2012 NR e Sc Lou y NANO RESEARCH FACILITY E me Check the following on the front panel e LEAK valve is closed clockwise ER e VENT valve is closed clockwise e The timer is set to the desired time e VOLTAGE CONTROL set to zero NA NANO RESEARCH FACILITY ll Loading specimens e Put on a pair of gloves e Open Ar gas cylinder gas pressure 20 30 psi e Open the top plate of the sample chamber e Place the sample mount in the sample holder e Close the top plate of sample chamber SS AN NANO RESEARCH FACILITY io cacas Bn Sa lil Pumping e Turn the OPERATION SWITCH to the PUMP position e Wait for the vacuum gauge to indicate 0 1 mbar May take up to 20min _ NANO RESEARCH FACILITY IV Flushing Chamber e Open the LEAK valve by rotating it counterclockwise until the vacuum gauge indicates 0 5 mbar wait for 10 seconds e Close the LEAK valve wait the system to pump down to 0 07 0 08 mbar e Open the LEAK valve again to flush argon for 10 seconds with the gauge Indicating 0 5 mbar e Close the LEAK valve and pump down to about 0 06 mbar wait about 5 minutes gt yT SCHOOL OF ENGINEERING amp ANANO RESEARCH FACILITY S A E V Coating Specimens e Open LEAK valve to 0 14 mbar marked e urn voltage co2. ntrol knob to 2 5 kV e Switch to SET HT quickly check current is reading 18mA and switch to CONTROL e Press start and deposition will occur for specified time Approximately 13 5nm minute WARNING If pressure is too high fuse will blow NA NANO RESEARCH FACILITY nami VI Shutdown e Turn voltage to zero e Close LEAK valve e Turn OPERATION SWITCH to OFF e Open VENT valve slowly to let Ar bring the chamber back to atmospheric pressure ANANO RESEARCH FACILITY Stones ndo VII Clean up e Take out sample and close the top plate of sample chamber e Close gas cylinder e Close the VENT valve Clean chamber with ethanol and Chem Wipe
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