Minilock-Phantom III RIE Operating Procedure
Contents
1. NCMN Nebraska Center for Materials and Nanoscience University of Nebraska Minilock Phantom II RIE Operating Procedure Effective Date 02 13 2013 Author s Jiong Hua Phone 402 472 3773 Email jhua2 unl edu 1 Introduction Ld Key Words Reactive Ion Etching RIE Inductively Coupled Plasma ICP 1 2 Purpose This document provides instructions for operating the Minilock Phantom III reactive ion etching RIE system which provides state of the art plasma etch capability Use of this tool requires the understanding of the fundamentals of plasma etching knowledge 1 3 Applicability 1 3 1 Locations The tool is located at Clean room of nanoscience research center 1 3 2 Safety The safety concern is the system uses high voltage electricity and high pressure gases Some working gases might be toxic 1 3 3 Restrictions and Limitations 1 4 e Must be a qualified user of RIE e The imitation for the substrate is that it must not damage the system Restrictions on Working Alone Normal working hours are from 8am to 6pm M F Working alone is permitted with completion of an orientation to this written procedure and hands on training from the specialist Assistance from the specialist is available during working hours only If an error occurs during off hours record the error in the Logfile and send an email to the specialist Tool will be checked in the following work day User will be notifi2. atic behavior of the setup by contacting the specialist 5 References 5 1 Technical References e Minilock Phantom ITI User Manual 6 User Access Level Normal User Requires specialist to be present Expert User Does not require specialist to be present
3. e flowing When active the power will be applied to ICP and or RIE The plasma will be enerated You must press the RF button again to shut off the plasma Automatic Process Control This mode of control has the computer run the entire process Contact specialist for more information Turn off the Gases and Gauge Press Gases button to shut off gas flow turn grey Press Press Iso button to turn off vacuum gauge in main chamber It turns grey and Gases button disappears Press Exit button to return to the main window 9 Unloading the Sample e Press Unload wafer button to active the unloading sequence Wait until the lid of the load lock opens e Take out samples from the sample holder Note be careful if the sample holder is heated e Put the sample holder back and align it to the right position e Press OK button in the message window to close the lid of the load lock e Press OK button in the message window again to pump down the load lock 10 Log file Entries Fill out the log file in the computer next to the machine with the corresponding parameters 11 Switch off Procedures e Press Log out button in the main window to log off the system 13 Clean up all samples pens and notebooks from the area End End of Procedure 4 Post Performance 4 1 Recordkeeping 4 2 Feedback Report any unusual or problem
4. ed when sample left in chamber is available for pickup Problems with equipment malfunctions breakage etc should be reported to the specialist and recorded in the tool Logfile In case of gas leakage or any other danger press the EMO button on the front panel of the system and leave the room immediately Contact the specialist right away For any emergency involving injuries fire chemical spills etc call 911 2 Preparations Receive this procedure from the specialist 3 Execution Step by step work breakdown Step Alerts Action 1 Checking status of the system before starting e Vacuum pumps the main pump and load lock pump works properly The turbo pump works under normal and least loading condition see through the indicating light on the front panel e Ensure that the lids of the load lock and main reactor are closed 2 Logon to the operating software e Turn on the monitor Make sure the operating software is running e Pull of the keyboard from the front panel e Click Logon button on touch screen and logon to the operating software with your name and password 3 Loading the Recipe e Check and ensure the recipe template is the current recipe and loaded If it is not contact specialist for help 4 Loading the Sample e Press Load Wafer button to start load sample sequence A message window will pop out asking Do you wish to vent the load lock first e Pre
5. ss Vent lock first button The system will vent the load lock first and then the lid will open automatically e Put samples on the sample holder and align the sample holder to the markers on the robotic arm e Press OK button in the message window to close the lid of the load lock The sample holder will be transfer into the main chamber after the vacuum of load lock chamber is pumped down to 300mT Wait until the sequence finishes En tat ame Manual Process Control Press Manual Process Control button to enter the manual process control window The parameters of the current recipe will show on the screen You may load other recipes by press Load Edit Recipe button The parameters can be modified by pressing on those variables set point value boxes A keypad will pop up for entering the new value Adjust all values to the desired ones At the bottom left of the window there are several control buttons The Vacuum button should be always on or green The Press Iso button should be on or green also If not press on it Only after Vacuum and Press Iso buttons have been active will the Gas button show up Press the Gas button show green to let the working gases that have been set to non zero value to flow into the main chamber The system will automatically adjust the pressure to the set value The RF button becomes visible once the gases ar
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