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DWL 66FS - BYU Cleanroom

1. 42 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 9 Click on the first row of the Design column e To do an exposure see the Exposures box below enter the name of the directory where LIC data is stored e To make a measurement enter the name of a measurement procedure see Measurements box below proceeded by an M DESIGN COLUMN Enter the path and name of the LIC directory where graphics data is stored 1 Exposures It is possible to expose more than one design or even the same design several times by entering more design names separated by a semicolon 2 Measurements The name of the measurement file must be entered proceeded by M e g M test msr If several measurements are to be executed in the same field a semicolon must separate the file names 10 Click on the first row of the Defoe column e Enter a value between 0 and 4095 as a focus offset e A value of 2048 means no defocus e lf the cell in the Defoc column is left empty the defocus value of the previous exposure is used e The 4095 steps equal an uncalibrated range of approximately 10um so one unit equals approximately 5 nm e Before making a final exposure a series of fields with the same pattern at various defocus levels is exposed to find the best focus offset for the exposure Necessary for substrates with relatively thick resists e When choosing the defoc values for such a series keep in mind that the fo
2. File creation error FILM FOGGING Fogging of emulsion coated films may have the following causes Too much ambient light Safe light with wrong filter Use a red filter or one recommended by the film manufacturer Safe light on for too long Out of date emulsion or media Safe light power too high 77 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Wrong developer THE DWL STOPS ANYTIME DURING THE EXPOSURE The accessed file is too big or the lic buffer is too small Try split lic The DWL reached an endswitch because the imaging area was set incorrectly during conversion or in the menu map The accessed file has the wrong format The data file is too complex which causes the MBCIII to be selected without being READY Try a slower writing speed or a smaller stripe width The interferometer head is broken PLATE COMES OUT COMPLETELY UNEXPOSED Wrong substrate for this laser type Something is blocking the beam path ONLY HALF THE SCAN IS EXPOSED Stripe distance was not entered correctly in the conversion wrong writehead chosen Wrong writehead installed Wrong configuration was chosen 78 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CHAPTER 5 OPERATOR MAINTENANCE INTRODUCTION The DWL 66 fs requires some minimal operator maintenance however only trained service engineers should perform regular maintenance on the system See Chapter 1 Safety Precautions SYSTEM CHECKS Befor
3. Setup The Setup commands allow for the setup or modification of a job environment as well as the setup and testing of a number of automatic or semi automatic sequences for alignment including the definition of image templates Measure Measure functions can be used for control of exposure quality Tools Offers access to a variety of tools for report analysis and other tasks Service Contains useful tools and functions for calibration and servicing as well as the function for changing the system configuration Help Gives access to information about the software version contacts the software history and the index of help topics on the use of the menu software More information on the user menu will be given in the step by step instructions further down in this manual For a complete reference on all available menu functions see the User Guide Il Reference Manual 16 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CONVERSION STATION The conversion workstation contains the conversion software package The purpose of this software is to convert source files from gerber dxf cif gdsii hpgl or structure format into the LIC format the machine needs as input During an exposure this LIC format data is converted in real time into the final pixel data set Theoretically the original design data could be converted directly to the final pixel set but the advantage of the LIC format is that its file size is much smaller
4. Airflow is adjustable to between 0 3 and 0 5m s and is preset during adjustment for optimum stability The heating system is situated below the top of the flowbox and is regulated automatically by a temperature control unit The temperature setpoint for the flowbox should be chosen 2 3 C above the room temperature to allow stable control As an option the air at the inlet can be precooled with an additional precooling chiller to allow a temperature setpoint that is close to the room temperature The temperature stability assuming 1 C 1 8 F outside the unit is 0 1 C 0 2 F on the inside CAUTION Although provided with a standard plug the heater is not to be plugged into a standard outlet rather into the designated outlet at the temperature controller The heating is installed by service personnel and is not to be modified by the user Improper installation can cause the system to overheat and to be damaged beyond repair e Light Depending on the type of coating on the plates to be exposed a red or yellow light may be switched on inside the flowbox HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part OPTICS SYSTEM The exposure optics of the DWL66Fs consists of four major parts The laser the beam shaping modulator the fast deflector and the write lens Additional optics include the camera systems for inspection measurements and alignment as well as the interferometric system for stage position control CAUT
5. Guide Part I Exposing Capote MHD DWL INTRODUCTION The expose window is kept as simple as possible and can be used to routinely run pre defined jobs It also contains additional access points for most of the controls used during exposure preparation loading focussing aligning Before exposing make sure the correct environment and the correct job are loaded Now follow the logical sequence given in the Expose window 46 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I EXPOSE INSTRUCTION 1 externally controlled laser H laser was set to Disable before open Laser menu and choose Enable If laser is off choose On NOTE Exposure lasers need a warmup time to stabilize before exposures should be started e g 3 min for TOPTICA diodes Refer to laser manufacturers guide for detailed information 2 Open the Expose window by highlighting Run Job under Job in the Main Menu e The following window will appear Set X 0 Y 0 oo Edit Report Manual Align Center Stage If the substrate was not yet loaded and focused 3 Load substrate and focus a Click on the Load button The stage will initialize if necessary and move to the load position A dialog box appears b Manually load the substrate c Click OK in the dialog box to let the stage move back below the write head d Click on Focus e Make sure substrate is completely under the nozzle before clicking on the Focus button 4 lf the ori
6. Open the a by clicking on the toolbar icon or by clicking on the DWL Control Panel under Service in the Main Menu W DWL Control Panel File Options Stage StepSize Positions View FER PA Step Field 2 Click on the INIT button Wel to initialize the stage e During the first initialization after system re start the stage will move slowly in negative X direction and then in negative Y direction until it reaches the end switches from where it will move back to the center position Any other time the INIT button is pressed the stage only moves to the center and the coordinate system is being reset by the software 25 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part e The orientation of the machine s coordinate system is shown in the following picture Click on the UN LOAD icon A e The write lens will move up and the stage will then move to the load position NOTE The LOAD button is also available in the Expose window which is opened by highlighting Run Job under Job in the Main Menu Before loading the DWL 66 fs i e loading the plate onto the chuck plug the stopper pins into the chuckholes for easy plate alignment If an unexposed plate will be loaded switch off the white light and switch on the safelight in the clean room before opening the plate container Check the manufacturers data sheet to find out which kind of safelight applies for the plate type used Usually for resist
7. PITCH AND STITCHING ege grg ergeteege ege E NE E AE Ee 71 IMTFOGU CTI ON SEA sede Cease inenceanacuetebenadsver dese tsvagedeeedahe lead yagdcens debuted a sdestanqeuedetevbesttabscaveenels 71 lee EEN 71 Pitch Measurements Instruction ecccceeeeeeeeeeneeeeeeeeeeseccaaeeeeeeeseseecneaeeceeeeeeesenennaneetees 72 GAMERA CALIBRATION iisssa ces iceessectveniiccdsieteasuedea Suedel SSES AER 75 Camera Calibration INStruCtion c ccccccsceccessneceeesneeeeessneeeeeseeeeesesaeeeesssaeeeessseeeeseseeeeessas 75 CHAPTER A ERRORS AND TROUBLESHOOTING ccceesseeeeeessceeeesseceeeenssceeeenssceees 77 CHAPTER 5 OPERATOR MAINTENANCE cccseseeecesssceeeesseceeeenesceeeenssceeeenssceeeenseneees 79 ele lee 79 EE Ree 79 Environmental Acdusimemte AA 79 Doc No DWL HI 022 Revision 1 Juli 2007 Copyright 2007 by Heidelberg Instruments HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Preface This manual is meant to help the user to start working with the main applications of the DWLG66Fs laser lithography system It contains a brief system description and step by step instructions for the standard tasks of the system operator This preface gives information about the terminology used in this manual as well as additional sources of information and support In the first chapter a brief overview of the system components and their interaction is given The second chapter contains simple step
8. Part LINE 5 LINE 6 LINE 7 NOTE Fields per Row e For each row of dies enter the number of dies it should contain separated by a comma As many rows will be created as there are numbers in this entry e The number of rows and fields per row must fit on the substrate Fields Start at X e Enter position in micrometers where each row is to begin in the X direction with respect to the field furthest to the left Field Zero e Enter the number of the field corresponding to the substrate origin The center of this field is the zero point for the exposure This has to match the coordinate origin set before with the Control Panel or by using the Set 0 0 function of the Manual Global Alignment NOTE If just one design is to be exposed on a mask without any alignment features the Map might look like the following Field Width 100000 value is of no importance but may not be 0 or void Field Height 100000 value is of no importance but may not be 0 or void Alignment Site X Alignment Site Y Fields per Row 1 Fields Start at X Field Zero 1 4 Click on the Draw button The Map corresponding to the latest entries will be displayed in the Map window 5 Close Exposure Map Design window with the Exit button 39 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Job Setup Which Data Set must be vre where and under BCS Ee what conditions E av
9. X Y stage Chosen for its reliability and ease of use the system s motion is controlled using the X and Y interferometer system and the linear motor controller The stage is equipped with a vacuum chuck OPTICS PLANE The optics plane contains all beam control elements lenses and mirrors The write lens is also mounted on the optics plane and is directed downwards onto the substrate To minimize heat generation in this area HeCd lasers are mounted above the optics plane in an own compartment HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part FLOWBOX The flowbox provides a stable environment for the DWL in terms of temperature laminar airflow and clean air guaranteeing controlled and constant exposure conditions and thus minimal variation of exposure parameters The front of the flowbox features buttons for powering up or down the system an emergency STOP button and a switch for lifting and lowering the window The covers of the flowbox can be removed for service by authorized service personnel WARNING Opening the flowbox covers gives access to dangerous laser radiation ELEMENTS OF THE FLOWBOX e Window Used for loading and unloading the DWL must not be opened during operation opening window will stop any movement and close laser shutter The toggle switch on the front of the flowbox controls the pneumatic system that lifts and lowers the window e Heating and Airflow System
10. coated metallized plates or wafers yellow safe light is necessary e Leave white light off until the plate is developed CAUTION If computer monitors are positioned close to the DWL they may after a while expose the plates Make sure that monitor brightness is set to a minimum Make sure that monitors are covered when plates are being handled in front of them for a long period Make sure plate and chuck are clean and smooth Take the plate out of the box Make sure the resist covered side of the plate is facing up 26 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 9 Place the plate onto the chuck e Keep the plate a little tilted until the stoppers are reached e Let the plate down carefully e The plate should be roughly centered on the chuck 10 Switch on the vacuum with the switch at the front of the chuck e The four white screws at the front of the chuck are used to adjust the size of the stage vacuum area to the plate size All vacuum areas are arranged around the center of the chuck SOCS gt 4cmx dem vacuum area SOCOM gt 6cmx6cm vacuum area SOD gt 106m x 10cm vacuum area SMD gt 126m x 120m vacuum area DDD gt 80m x 160m vacuum area NOTE In case the plate is even smaller than the smallest vacuum area use a thick foil e g copy foil to cover the open chuckholes 11 Once the plate is in place and the vacuum is switched on make sure that the vacuum hold down
11. if required All commands to be executed before an exposure or measurement must be preceded by the keyword BEFORE Commands to be executed after the exposure measurement are to be preceded by the keyword AFTER BEFORE AFTER These two words must only appear once but each can be followed by a number of commands The commands must be separated by a semicolon For a list of available commands refer to User Guide Part Il CAUTION Use the BEFORE AFTER option with care and test it thoroughly 44 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part NOTE e For special service jobs the Command column is used for placing OS9 commands e Enter a command preceeded by OS9 e H an OS9 command is not preceded by any of the two keywords BEFORE or AFTER the command will always be executed before an exposure measurement 13 Repeat steps 4 through 11 proceeding to the next spreadsheet row for every cycle e Repeat for the number of rows i e fields necessary 14 To save a current job file under a new name scroll down and highlight Save As under File in the Edit Job Main Menu or save it under the original name if applicable by highlighting Save under File in the Edit Job Main Menu 15 Once the setup of an exposure is complete close both the Map and the Edit Job window by scrolling down and highlighting Exit located under File in the Edit Job window 45 HEIDELBERG INSTRUMENTS DWL 66Fs User
12. the expansion in X of a fit to the measured intensity values at a given threshold value 0 The Figure shows that there are different methods for finding the expansion in X Inside Outside etc and various procedures and thresholds can be defined 66 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part MODEL LineWidth X Measures the width of vertical lines LineWidth Y Measures the width of horizontal lines Thick LineWidth X Selects the measurement method for thick vertical lines larger than monitor image Thick LineWidth Y Selects the measurement method for thick horizontal lines larger than L monitor image PROPERTIES Threshold Defined in percent with the amplitude of the normalized video profile equal to 100 For most purposes the threshold value should range between 25 and 50 Repeats In order to improve the results the pixel count for the whole box can be done several times and the result will be averaged Inside The line width is defined as the horizontal expansion of the profile at the threshold value The profile is traced until the threshold height is reached starting at the center Outside The line width is defined as the horizontal expansion of the profile at the threshold value The profile is traced until the threshold height is reached starting at the endpoints Minimum 67 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I The line width is defined a
13. which is opened by highlighting Run Job under Job in the Main Menu The DeFoc slider sets a focus offset leading to a different final position of the lens with respect to the substrate Usually it can be left in the default position of 2048 The defocus value for the final exposure must be found in a series of test exposures 28 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Global Angular Alignment INTRODUCTION Even when alignment stops are used a substrate will usually not be loaded perfectly parallel to the system s coordinate axes However in some applications a correct angular placement of the design is mandatory and it is especially important for correct measurement results To align the coordinate system of the DWL to the angular position of the substrate it is therefore possible to manually do a global angular alignment after loading As alignment marks preexposed structures can be used or the edges of the substrate For an alignment along the x axis horizontal lines are best while for the y axis vertical lines are recommended CAUTION If plate edges are used for alignment no focussing may be done during the routine or a nozzle crash will occur MANUAL ALIGN PROCEDURE 1 Open the Control Panel by clicking on the icon in the toolbar 2 Select the camera that should be used for alignment Use macro camera for rough adjustment micro camera for fine adjustment In case of systems equipped with back
14. 0 4200 e Change Ali to 4 so alignment is executed using all 4 corner crosses e Change design name to OL lt focal length of write head gt mmCU 1000 5000 1000 5000 e Expose 51 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 8 After developing determine the registration Layer CM CU between the layers either by using an overlay measurement on the box in box structures or by checking the overlap of the line structures e Enter the numbers gained from the measurement into the menu configuration file by adding it to the values given for XBEAM and YBEAM 9 Perform another test exposure repeating steps 1 through 8 e Repeat until registration is satisfactory Note The overlay test design is prepared with a different magnification for each write head The numbers given in the picture of Layer CM CU are valid for magnification 1 which is used for 20mm write head For the other write heads the numbers are scaling with the focal length OVERLAY EXPOSURE INSTRUCTION 1 If since the last overlay exposure the write head has been moved for any reason perform the overlay accuracy test first 2 Expose and develop first layer 3 Setup a field alignment method for a typical structure which should be used for alignment of the coordinate origin for each field 4 Perform a manual alignment for rotational correction 5 Set the origin in the position demanded by the design 6 In t
15. D 6 Logout after 38 seconds Total time 0 31 03 OS 9000 for the PowerPC tm ELTEC BAB 740 600 06 08 28 13 12 40 User name dwl Password 6 Close the terminal by again clicking on the icon or the X in the upper right corner of the mini terminal window A window will open showing the system settings of the current configuration Confirm with OK Now the communication port is available to process commands and exposures can be prepared 7 Switch on the laser with the key switch externally controllable laser e g diode Open menu Laser and choose On NOTES e The exposure laser and the interferometer laser must warm up before initializing the machine and exposing Switch on the laser and the DWL 66 fs electronics at least 30 minutes before exposure e When the DWL is not performing tasks for a longer time it is advisable to close the Main Menu and shut down the computer e Even if the PC was shut down it stays logged in at the system controller The login procedure only has to be performed again if the system controller electronics was switched off or rebooted menu message DWL does not respond 19 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part POWERING DOWN INSTRUCTION iP Switch off the laser using the key switch externally controllable laser e g diode Open menu Laser and choose Off Exit DWL66 Menu by highlighting Exit under the File submenu e Confirm menu shut down in dialog
16. HEIDELBERG INSTRUMENTS UserGuide Part I System Operation DWL 66FS HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part TABLE OF CONTENTS PREFACE E E E E saueesuevsthv ects ieee E E A 1 RELATED DOCUMENTATION c ccccceeceeeseeeeeeeeeeeaeeceeecaeeeaeecaeecaneceaeeeaeecaeesaeeseeeseaeeneeneetaes 2 CONVENTIONS USED 17 eusftrecteEe genee deeg REESEN ENEE EENEG 2 CONTAC RE 3 CHAPTER 1 GETTING STARTED i gees Ee EENS 4 VIMEO CUI CTO EE 4 SAFETY PRECAUTIONS weiss eege fetes tes titer chests reese dee eee needed eaS 5 WAN Une e N E E N E A A E A A EE E A EATS 5 General Precautions soitinten NENNEN EEN ed Eaa aa a a aaan 5 Laser Satety iccse aaie eaaa aaia aaa aa eA A A SEA 6 Electrical Satety ss ccsescs eiia e aa e cite a Ea D a a anaa 6 hRS de ed ee TE HE 7 EIERE 7 FIOWDOX sessed A hee ese O A ene eed aaa A eee eevee 9 Optics SVSUCM isss inris a n eud eeaeee sa died oti ened 10 Electronic Control UNIS Assesi sidosaine aoina bt aei Naana Caa 14 ser PG E A ean eee E E T 15 Gonversion Station ussite is his ied dh Dn et dais 17 APPLYING POWER POWERING DOWN A 18 Appiving Hee OT ee In KEE 18 Powering Down Instructon 20 CHAPTER 2 HOW TO PREPARE TASKS 0 csccseseeesseeeeseeeeeseeeusaeeeneeeenseeeeseeesasaeeeseeeenseeeneas 21 luuten DEE 21 CHANGING WRITE HEAD AND EXPOSURE MODE A 22 IMTOGUCTION sensn an aeeeutin nesedenrarseabbveesteeeten deel biasen din aneestvtyede live atveren tie 22 Changing Writehe
17. INSTRUCTION CAUTION e Move the writehead completely up before changing as to minimize the risk of damaging the nozzle e Take care not to touch the interferometer mirrors during the process of write head changing Touching the interferometer mirrors with bare hands will damage them beyond repair 1 Unplug the motor cable and piezo cable as shown in the figure below 2 Use a 3 Metric Allen wrench to loosen the four screws located on the top of the write head Top view of the write head 1 Compressed air hoses Motor cable 22 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I CAUTION a Hold write head with one hand b Push write head up while loosening the screws c Be careful that write head does not fall and damage the nozzle and or the chuck 3 Let write head carefully down until it rests on the plastic holders then pull it out Hold it fast so it doesn t fall and touch the chuck 4 Place new write head into the holder with the piezo connector and motor cable facing away from the machine e Don t let the nozzle touch the chuck 5 Push write head in as far as it will go 6 Tighten screws X wise as indicated below while pushing up on the write head e Make sure write head is tightly mounted and in its correct position CHANGING SYSTEM CONFIGURATION INSTRUCTION 1 Open the DWL 66 fs menu on the User PC and double click on the configurat
18. ION All systems are factory adjusted and can only be worked on in the field by experienced Service Engineers e LASER UNIT The DWL 66 fs runs either a 442 nm HeCd laser or a 405 410 nm Diode laser The laser head is mounted directly above HeCd or on diode the granite base The power supply is in both cases set outside the system as it generates heat WARNING e The laser is a class Ill b category and under these conditions personnel must observe safety precautions i e sufficient eye protection e Never look directly into the laser beam e Never sight down a beam into its source e BEAM SHAPING MODULATOR An extremely swift modulator system generating up to 32 various beam positions can digitally turn each beam position on and off 10 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I e FAST SCAN DEFLECTOR The acousto optic deflector device generates a swift laser scan with an approximate sweep rate of 40 kHz The scan angle is imaged into the back focal plane of the write lens resulting in a telecentric scan arrangement so that the laser beam is always perpendicular to the substrate e WRITE LENS SYSTEM Various write lenses can be utilized The focal length of typical lenses is as follows 2mm Used for high resolution metallized plates and wafers 4mm Used for high resolution metallized plates and wafers 10mm Used for low resolution metallized plates 20mm Used for high resolution emu
19. Overlay Measures the relative positioning accuracy of two overlaid exposures on a single plate by utilizing a number of models such as box in box structures etc e Distance Offers both an automatic and a manual metrology method for measuring the distances between two features on a substrate e Positions Measures die to die alignment of a feature in order to ensure that the machine coordinate system is linear and orthogonal e Linewidth Measures and analyzes the line width of a feature based on its video profile e Pitch Stitching Edge Measures the distance between two identical features by associating video profiles of the images and then searching for the maximum in the correlation function These measurements are then repeated in different locations and the results are analyzed according to the method chosen 54 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Overlay Measurements INTRODUCTION The purpose of overlay measurements is to determine the registration between two exposed layers that are printed on top of each other In order to achieve the best results the micro camera is used for most overlay measurements The Heidelberg Instruments PERFORM Test Pattern can be used to check the overlay quality of the system For each write head there are several special performance files available Measurement methods for two types of test patterns are availabe The Large Box in Box method and the Small Box in Bo
20. Site Cancel e Once file is loaded proceed directly to Step 10 e To set up anew measurement file choose one of the Methods described above for a measurement in the X or in the Y direction Click on the Set Up button to setup measurement program Depending on which model was selected the Define Box window appears requesting that measurement frames be placed over the structure After the program is set up click on Cancel to close the Define Box window Start measurement by clicking on the Measure button and continue the measurement until enough data is collected e A result window shows the updated values e After the measurement the average value is displayed To save the measurement program select a reference point e lf a reference point is not selected the program will simply save the current position as the reference point e To define a reference point click on the Relative To button 64 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I e For a local series of measurements the location of the first structure is usually chosen as the reference point e When preparing a method including a fully automatic program the field alignment site can be used 10 Save measurement program by highlighting Save Measurement located under the File menu in the Position Measurements window e Incase a reference site has never been marked a window will appear notifying the fact and asking if the method should be
21. _ lt focal length of write head gt e In systems with only one write head the environment is sometimes called align 3 Expose the first layer of the test design 50 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part e In the Job file enter 0 in the Ali cell and OL lt focal length of write head gt mmCW in the Lic Buffer cell e Choose standard energy and defocus e Run the exposure 4 After developing load substrate and move one of the corner crosses of the design close to the center of the monitor image Edit the current field alignment method by highlighting Field Alignment Method under Setup in the main menu and test the method by pressing Test e f problems occur try to adjust the method until it works reliably Layer CM 5 Execute a manual alignment procedure along the y axis choose No using the two crosses at either end of the overlay design 1000 5000 1000 5000 e Press the Auto button to use the eg Field Alignment Method for 7 structure position detection when the crosses are well within the monitor image field 200 4200 200 4200 LN lines 40 um pitch 200 um e Do not Set 0 0 position 200 200 200 200 6 Open Expose window and press the Find Center button to determine the coordinate origin should be roughly 400 200 200 200 in the center of the sloping cross Ill structure 7 Expose the second layer D 200 4200 20
22. a clear outline e Using Pos XY for a cross where the outline is blurred e g by an additional resist layer Indicate the borders of the cross following the instructions given e The system will try to detect the cross and determine the width of the lines e All values camera settings alignment method settings are entered into field alignment procedure macro which is automatically setup after the method has been chosen and the cross has been detected To check test and edit the field alignment macro that has been created highlight Field Alignment Method Check if the values obtained from the bracket behind the alignment method are non zero otherwise manually enter estimation for the values necessary All values are in tics e Pos XY Values to be entered are in the following order Small side of measurement box should be larger than the cross linewidth Large side of of measurement box 4 5 times the cross linewidth 33 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I 7 Distance of measurement boxes from monitor image center should be around 200 pixels depending on the size of the cross more than one linewidth Test method by clicking on Test button SETUP OF OTHER ALIGNMENT PROCEDURES bk 2 Load plate and focus Using the Xy Stage buttons in the Control Panel move substrate so that the structure is well within the monitor image field Optimize camera settings lamp offset gain f
23. a high resolution imaging system where over a million dpi is achieved using a 25 nanometer writeable address grid for exposing metallized plates or wafers Depending on the individual X Y stage a DWL 66 fs will accommodate media up to 6 x 6 inches or even 8 x 8 inches Design data can be created with any program using DXF HPGL Gerber GDSII or CIF format and is converted into a LIC format on a CONVERT workstation Design data transfer to the system is then realized via an FTP connection HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Safety Precautions WARNINGS The DWL machines use lasers and high voltage electronics Please read this section carefully before operating the system If instructions are not followed carefully danger to personal health and damaging the equipment is at risk GENERAL PRECAUTIONS The DWL 66 fs protects operators from exposure to moving parts and laser energy while operating the equipment All moving parts lasers and their associated optics are enclosed within the laminar flowbox During operation opening the flowbox window will automatically stop an exposure Please observe the following safety precautions while operating the DWL 66 fs Follow all warnings and instructions given in this manual the user menu software or our engineers Ensure that both the voltage and frequency of a power source match the voltage and frequency stated on the equipment s electrical label Except when lo
24. ad Instruction 22 Changing System Configuration Instruction c cccceceeeceneeeeeeeteeeeeneeeseaeeseeeeseaeeeseaeeseaes 23 CHECK INTERFEROMETER GTATUS 24 LOADING E 25 FOCUS OT 28 GLOBAL ANGULAR ALIGNMENT cence eeceeeeeaeeeeeeeeseaeeeeaeeseaeeseeeeseaeeeeeeeeee 29 MORU ON EE 29 Manual Align Procedure EE 29 SETTING THE ORIGIN i testi eeitieet Alien aaaea eaea Oi ete ees eee eee 31 MMPOG U COM EE 31 Origin INSthuCtiONn iiis i ieee edad aerate one niai aaaeaii a aaeain aaan 31 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part PREPARING FIELD ALIGNMENT GEOUENCES 32 HrOUG HO cer E E ereteusveddduartadantaxeanatettesaamexeeasteeters 32 Setup of a Field Alignment Procedure 33 CHAPTER 3 HOW TO DO EXPOSURES csescceseeeseeeeeeneeeeseeeueaeeeneeeenseeeeeneesesaeeeneeeeeseeeneas 36 dude ege E 36 CREATING A JOB ENVIRONMENT sseeseeeeieeseeeressrrssrrssinssrntsistsrntsrrterntsrntstnnstenstnnstnnnenent 37 Adjusting the Exposure Map 37 JOB SETUP isro aae e aa aaa aA reneeel does 40 dutt eeleren E 40 Job Setup Instructions siioni annaa eh neta deta NEEN 40 EXPOSING EE 46 into duc HON EE 46 Expose lnsiuCi oieee nnn E A exten geen 47 t TN 49 OVERLAY EXPOSURES ciscsieciisscaedeceiedepaedeathaetette presen gineetaues eat pao aa aaa aa anae aaa RNR E 50 Unices Tei o DE 50 Testing and Adjusting Overlay Accuracn 50 Overlay Exposure Instruction 0 cccceeeeeeeeneeeeneeeeeeeeteaeeeeaeeeeaeeeeeeeeeeaeeseaeeseaeeseeees
25. ading media never push objects of any kind through openings in the equipment Dangerous voltage levels may be present Conductive foreign objects could produce a short circuit resulting in a fire electric shock or permanent damage to your equipment To reduce the risk of electrical shock always plug the DWL 66 fs into an approved outlet with correct safe ground Power requirements are described in the DWL 66 fs Preinstallation Guide Not all power cords have the same current ratings Household extension cords do not have overload protection and are not meant for use with computer systems Never use household extension cords with the DWL 66 fs or any of its external components HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part LASER SAFETY During normal operation the DWL 66 fs is a class 2 laser product Opening the optics covers and leaving them open during exposures changes the laser class to that of the exposure laser 3B or 4 depending on system configuration In case of the optics cover covering the laser the safety class of the laser source directly applies upon removal of the cover Only trained personnel may be allowed to remove any optics covers ELECTRICAL SAFETY Operating power for the DWL 66 fs is supplied by a CEE type 220 240 V 16 A connector Alternatively a CEE type 220 240 V 16 A single phase female cable connector can be used to connect a local type cable to a local type wall connector See the Preinstal
26. al TERETE EITC d INTRODUCTION When choosing Make Job in the Job menu the Edit Job spreadsheet opens This sheet allows the user to choose exposure or measurement parameters such as the exposed Design allowing also the selection of a predefined measurement routine instead Defocus and Energy JOB SETUP INSTRUCTIONS 1 Highlight Make Job located under Job in the Main Menu The Edit Job spreadsheet will appear la Edit Job DEFAULT DWL oO x File Edit BI command selection tox i _ Field do Jay ep Ivo Design Defoc Energy Command ao The contents of this spreadsheet determine which data set will be written where and under what conditions 2 Together with the Edit Job spreadsheet a graphical representation of the Map currently loaded for an exposure measurement is being displayed See User Guide II for more information on the functions of the Map window 40 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 3 The following options are located under File in the Edit Job window Highlight New to open an empty spreadsheet The number of rows in the sheet corresponds to the current Map file Load a Job file from the VBMENU WAFER directory if available If the corresponding Map file is not loaded then only the number of fields that cover the current Map file will be displayed NOTE The corresponding alignment file will not necessarily be loaded If an alignment is nec
27. align the machine coordinate system to alignment structures on the substrate Aside from the manual angular alignment described before this also means that the coordinate origin for each field should be adjusted according to the position of an alignment structure which is part of each of these fields To do this a field alignment method for detection of the structure position must be set up and the coordinates corresponding to the structure position within the design coordinate system must be entered into the Map file 32 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part SETUP OF A FIELD ALIGNMENT PROCEDURE There are two ways of setting up a field alignment procedure for a DWL 66 fs If the alignment structure is a cross the procedure may be prepared automatically by using one of the Simple Cross Alignment commands under Setup in the main menu while the structure is in clear view of the camera If the structure to be used for alignment is not a cross the complete procedure must be setup automatically SETUP OF A SIMPLE CROSS ALIGNMENT 1 2 Load plate and focus Using the Xy Stage buttons in the Control Panel move substrate so that the cross is well within the monitor image field as close to the center as easily possible Optimize camera settings lamp offset gain for best contrast Highlight Simple Cross Alignment under Setup in the main menu There are two methods offered e Using Find XY for a cross with
28. an be used to obtain more detailed information about the system processes for analysis by HIMT service engineers This option needs a lot of disk space and should only be used if absolutely necessary 49 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Overlay Exposures INTRODUCTION Several preparations are necessary to do overlay exposures Before starting an exposure of the second third layer the machine coordinate system must be aligned to the previous layer s on the substrate and the position of the write beam must be measured with respect to the center of the monitor image Note It is important that for overlay exposures all layers are converted with the same stripe width that the calibration was done with Otherwise an offset in x corresponding to half the difference of the stripe width from the calibration stripe width has to be taken into account TESTING AND ADJUSTING OVERLAY ACCURACY The testing and adjustment of overlay accuracy must be executed whenever a write head has been changed or removed for any reason since the last overlay exposure Such a procedure serves to measure the write spot position with respect to the center of the monitor image which is the reference point for alignment 1 Load a fresh substrate and set the zero point in the center use Find Center function 2 Load the environment for overlay test exposures which was setup for the current write head C VBMENU wafer align
29. box Shut down Windows by pressing Alt F4 or choosing shutdown from the start menu 4 Switch off computer and monitor if not done automatically D o Press the red OFF button located on the front panel of the DWL 66 fs For a complete shutdown switch off the red main breaker at the front of the electronics rack 20 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CHAPTER 2 HOW TO PREPARE TASKS WARNING e Be sure to read all safety instructions outlined in the safety precautions section at the beginning of this guide or within this section before operating the DWL 66 fs e Always observe all warnings during use of this laser device INTRODUCTION This chapter contains instructions for all procedures that are needed before an exposure or measurement process These are e System setup instructions configuration settings substrate loading etc e Data preparation setup of a job environment and the related task sets e Matching of coordinate systems alignment setting of origin 21 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Changing Write Head and Exposure Mode INTRODUCTION The DWL 66 fs is designed such that the user can easily change the write head in order to change the resolution of an exposure or measurement The resulting resolution values depend on the detailed system configuration and can be found in the system specification section of the quotation CHANGING WRITEHEAD
30. by step instructions for exposure jobs They guide the operator through preparation and completion of exposure jobs using the DWL66Fs menu the graphical user interface designed to give the operator an easy to use control over the system functions In chapter three the measurement features of the DWL66 are being explained This set of functions is dedicated to position and linewidth measurements for system calibration or quality checks Chapter four gives some simple troubleshooting procedures for common problems The last chapter contains information on maintenance procedures HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Related Documentation Heidelberg Instruments offers several further Manuals related to the machine and its operation If you did not get one of these or need an update please contact Heidelberg Instruments Germany Preinstallation Guide System requirements sizes and weights of components etc Conversion Software Manual Manual for the HIMT conversion software used for data preparation and fractioning User Guide Part II Reference Manual for functions of the GUI as well as the Matrix Commander program Conventions used Throughout this manual there are safety warnings To classify the degree of danger in each of these situations the following notation is used CAUTION Advises that you risk damaging your equipment if you do not heed instructions WARNING Advises that you risk danger to personal healt
31. cus depth of e g the 4mm write lens is 1 8m and the autofocus is stable within a range of 100nm e Since the 40mm write lens has a focus depth of 250um it is not necessary to adjust the autofocus offset when working with this lens 43 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 11 Click on the first row of the Energy column Enter the number for an intensity correction file the file 100 sets the energy to 100 90 sets the energy to 90 etc Not all values are available Generally the values from 10 to 100 in steps of 10 are prepared To check which files are available open the mini terminal and type chd sys followed by dir The files corresponding to the numbers will appear with a preceeding H Before leaving the Mini Terminal retype chd Similarly to finding the best focus by varying the defocus the Energy column is used for finding the best energy by varying the energy across an array of fields If less than 30 of the maximum energy is necessary use the grey filters for a basic adjustment 12 Click on the first row of the Command column Enter a number of commands to be executed before or after the exposure or measurement The available commands are listed in the selection box on the right above the Job table To select a command highlight it in the list and click on the Use button The command will be automatically added to the current command sequence Enter the numeric or string value
32. d before the machine can be expected to produce consistent results Hence installation must be done in two stages STEP 1 System set up and function tests These tests can be started when the granite system has been placed in its final location for anywhere between 24 48 hours They serve to demonstrate the functionality of all components e Until a system has completely adapted to its location final calibration procedures will not prove useful STEP 2 Calibration and end test Once the system has thermalized and everything is functional tests and measurements for fine adjustment and end calibration are done This procedure is often followed by a final acceptance test in cooperation with the customer HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part ELEMENTS OF THE GRANITE CONSTRUCTION SYSTEM SUPPORT The granite base is supported by a heavy duty aluminum construction and four air filled buffers for vibration isolation These buffers are arranged in a quasi three point system as to avoid any unnecessary bending forces in the granite MAIN BLOCK The main granite block has gaps to accept the air buffers so that the block s center of gravity lies below the TOP VIEW SIDE attachment points of the air buffers SUPPORT VIEW This increases the stability of a system during writing The block also contains screw holes to attach other components to the granite system STAGE SYSTEM The stage system is a linear motor
33. distance can be small as to fall within the camera image or large as to encompass the entire stage travel range Repeating measurements several times can enhance the precision and will result in additional statistical information The best values are obtained when automatic template recognition is used for the real measurement 60 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I MEASUREMENTS USING MANUAL ALIGNMENT INSTRUCTION L Load the DWL with the substrate to be measured as described in the Loading and Focusing sections Use the XY STAGE directional buttons on the Control Panel for moving the stage to the structures to be measured Open the Distance Measurements window by highlighting Distance located under Measure in the Main Menu Distance Measurements Set Up Measurement Alignment Manual LI O tive Template St pC ee Make Template ee Goto sites 7 Goto Site 2 Repeat Measurement 10 times Hepeat Measurement Check Manual inside the Alignment box e For instructions on how to proceed using a template read the next section Click on the Set Up Measurement button and the Point to 1st Site window will appear Using the cursor select first and second measuring sites e If the two sites do not fall within the camera field use the Control Panel to move the stage e The Control Panel may be used to switch between cameras adjust the contrast etc To view the two chosen reference s
34. due to a highly optimized compression leading to a much faster data transfer from the workstation to the system 17 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Applying Power Powering Down CAUTION Never use a timer switch with the laser In case of emergency press the large red STOP button located on the front of the DWL machine APPLYING POWER INSTRUCTION E Press the green ON button located on the front panel of the DWL 66 fs e f system was switched off with Emergency Stop button that button must be released first e If the power does not come up check if the red main breaker at the front of the electronics rack was switched off t 2 Switch on the User PC MAIN BREAKER 3 Open up the DWL66 user menu by clicking on the S icon The following menu bar will appear DWL66 Heidelberg Instruments File Job Setup Measure Tools Service Help Job File ACCO2DWL Field Ali ACCO2FA 2mm WriteHead E LE JIE 2 IER Ae Fine accozmar EE Open up the Mini Terminal by clicking on the icon The following window will appear f Mini Terminal Oy x File 18 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I 5 Press Enter for the login prompt to appear Login by entering dwl The password is set to dwl by the factory but it can be changed consult Heidelberg Instruments f Mini Terminal Bisi x File O0S 9000 Grundinstallation DWL335 170 168 10 76 SCSI I
35. e Replace Current Value CAMERA CALIBRATION INSTRUCTION 1 Load substrate as described in Loading and Focusing 2 Select camera to be calibrated and switch on the camera monitor e Use the DWL Control Panel to select camera 3 Move a clearly defined structure on the substrate i e a cross to the approximate center of the screen 4 Train system a template for finding the defined structure at various stage positions NOTE Camera calibration may also be done manually but the result may be less precise a Use Gain and Offset slides to optimize contrast of the image b Exit Control Panel c Highlight Video Calibration under Service in the Main Menu and the Camera Calibration window will appear 75 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part d e 9 Click on Make Template and the Define Template window will appear Define a template from the image on the monitor by placing a box of an appropriate size above a structure or part of a structure which can be easily recognizable even if it is in a different part of the monitor image First place the box and then choose the size Store the template in the temporary memory on the frame grabber card by clicking on Save Template in IPC Test template If the result is poor try to improve the contrast or find a structure better suited and repeat instruction beginning at Step 4c Select number of data points and the range of the camera field over w
36. e Part I 9 Point to 1st Site e Once file is loaded proceed directly to Step 12 To set up a new measurement file choose one of the Methods described above Choose the Properties as described above Click on the Set Up button to setup measurement program Depending on which model was selected the Define Box window appears requesting that measurement frames be placed over the structure After the program is set up click on Cancel to close the Define Box window 10 To save the measurement program select a reference point e lf a reference point is not selected the program will simply save the current position as the reference point e To define a reference point click on the Relative To button e For a local series of measurements the location of the first structure is usually chosen as the reference point e When preparing a method for a fully automatic measurement procedure the field alignment site can be used 11 Save measurement program by highlighting Save Measurement located under the File menu in the Line Width Measurements window e Incase a reference site has never been marked a window will appear notifying the fact and asking if the method should be saved anyway 12 Start measurement by clicking on the Measure button and continue the measurement until enough data is collected e A result window shows the updated values 69 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I e After the
37. e operation the following routine maintenance should be performed 1 Make sure all access covers are firmly in place 2 Clean the chuck surface with a dry towel 3 Verify that the room temperature and humidity are within the following limits TEMPERATURE 65 75 F 18 24 C NOTE In addition to being within the recommended range the temperature must be stable within 2 C in order to assure high quality film and plate registration RELATIVE HUMIDITY 40 to 60 non condensing CLEAN ROOM Class 1000 ENVIRONMENTAL ADJUSTMENTS 1 Allow room humidity to come within the specified range before using the MaskWrite 2 If temperature is out of range determine how long this condition has prevailed 3 Adjust room temperature to within the specified temperature range and allow the DWL to stabilize 4 For stabilization of the system allow an amount of time equal to the time the temperature was out of range NOTE 79 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part During imaging the most accurate results are obtained when the environment remains at a constant temperature and humidity If the system is equipped with a laminar flowbox to achieve the optimum accuracy during imaging place substrate on chuck 2 3 hours before exposure close DWL window and do not open window until exposure is finished 80
38. eaeeseeeeene 52 USING BACKSIDE AUIOGNMENT AA 53 dude Leg DE 53 Testing and Adjusting BSA ACcuracy 53 CHAPTER 3 HOW TO DO METROLOGY ceccceseeeeseeeeeeeeeeneeeneeeeeeneeenseaeusneeenneeeeseesneneeeneeee 54 dude Leen EE 54 OVERLAY MEASUREMENTS sssssisinisisnisnnnerenrininnnirekn nurane arinaa u rakennan nienean 55 dude leen EE 55 Large Box in Box Method EE 56 Small Box ini BOX Method ccccsesccveitie tients aes abe ba agksecvesr anced aaa SEENEN 57 Overlay Measurements INStrUCtiONn ccccceeceeeeeeeteneeeeeeeeeeaeeeeeeeeeaeeeeeaeeseaeeseeeeteaeeseneeeees 57 DISTANCE MEASUREMENTS issessesesssesseesiesrisstittrttsttrtttitttrnttrnttrnttnntttnstunattnttnnnennnsnnnsnnnnnnn 60 OTO Leg DE 60 Measurements Using Manual Alignment Instruction 0 eeeeeeeeeeeeeeeeneeeeeeeaeeeeeeeaeeeeeenas 61 Measurements Using a Template INStrUCtiON eee eeceeeeeeeeeeeeteneeeeeteneeeeeeeeeeeeteeeeeeeenaees 62 POSITION MEAGUIDEMENTE ssurreieni ai eenninin eranan naannadnea audae deanai taaah areira nainii 63 dutt teller ge anssen anna NN 63 Position Measurements INStrUuCtion s s iisssinsinsurninnannnan ninnaa naa inna a AAA N NNA AAAA KAR ARA AAA 63 LINEWIDTH MEASUREMENTS 2 ce cceecceeceeeeeeeeeeeeeecaeeceeeceeeeaeeeaeeeaeeeaeesceseneseaeseaeeeieesaees 66 dutt telen EE 66 MOGEL eio i ind ns ed EE ee 67 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Propertles EE 67 Linewidth Measurement Instructon nent 68
39. een completed an exposure or automatic measurement process can be easily and repeatedly done using the Run Job utility 36 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Creating a Job Environment 1 Highlight New under Setup in the Main Menu e The New Exposure Map window will appear New Exposure Map feck gt vbmenu wafer C Steen 2 In the directory select box on the left VWBMENU WAFER should already be selected If not open these folders before proceeding 3 a To create a new job environment directory click on the Create Map button and input a name consisting of not more than eight characters e The eight character name entered is used as project name for all components of the environment e A project directory is created and the program copies three default root files from VBMENU WINDWL into the new directory giving them new names consisting of the project name and the respective extension b To load an existing map click on the environment folder in the directory select box then double click on the map file lt project name gt map listed to the right 4 Confirm in dialog box to change to the new project environment 5 Press Set Environment 6 Exit New Exposure Map window ADJUSTING THE EXPOSURE MAP If an exisiting environment was loaded the data from this environment is now ready for use If a new environment was created the default map is loaded and can be adjusted 1 High
40. erns as shown in the figure on the right A frame is written to the first layer and a square is written to the second layer over the first layer Ideally the centers of the two structures Sveriay in x coincide Overlay Center Center How well the two layers actually do coincide is to be determined by the Overlay Measurements program MEASUREMENT PROCEDURE The overlay is determined by measuring the distance between the symmetry axes as shown in the Small Box in Box figure above OVERLAY MEASUREMENTS INSTRUCTION 1 Load DWL with the substrate to be measured as described in the Loading and Focusing sections 2 Move stage to chosen overlay structure 3 Highlight Overlay located under Measure in the Main Menu e The following window will appear Overlay Measurements File Results Models Large Box in Box X Box in Box XY Modell Large Box in Box Y Box in Box XY Model2 Set Up Relative To a 4 To proceed with a measurement file previously created in the MEASURE directory open up the Overlay Measurements File menu highlight Load and load desired file e The Model option is read from the file and switches on automatically 57 HEIDELBERG INSTRUMENTS DWL G6Fs User Guide Part I A Window will request to Point to the Reference Site relative to which all positions will be measured Point to 1st Site WE xi 0 WW 0 Once file is loaded proceed directly to Step 11 T
41. essary check the current alignment procedure before executing the new exposure Job Load a New Map from the VBMENU WAFER directory A New Map with default settings appears and a new Job file with the name NONAME DWL is created The name of the new Map is used to create a new environment folder that will contain all environment and job files connected with the new map Each option will also automatically lead to an update of the Map window The following steps describe the setup of a new sheet column by column For a thorough description of available options and the Edit Job menu commands see the User Guide PART Il 4 In the Edit Job window the first column Field Column shows the row number which is at the same time the number of the corresponding field It can not be edited Whenever a row in the spreadsheet is highlighted the field with the corresponding field number in the Map window will turn blue FIELD COLUMN Contains a field number which refers directly to the field in the wafer Map shown concurrently with the Edit Job window The field number usually coincides with the number of the row it is in but this is not essential Fields will be exposed according to their position on the sheet and not according to the field number However fields cannot be moved using the menu Use i e MS Excel for moving fields 41 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 5 Click on the first row of t
42. ete click Exit and return to the main menu window 62 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Position Measurements POSITIONS X5 Y5 Xs Y6 X7 Y7 Xs Ye X9 Y9 REFERENCE X1 1 X2 Y2 X3 Y3 x4 Y4 SITE INTRODUCTION Position measurements provide information not only about distances but angular distortions or non linearity over a substrate as well Position measurements are therefore an important tool for initial system calibration and exposure quality control POSITION MEASUREMENTS INSTRUCTION As Load the DWL with the substrate to be measured as described in the Loading and Focusing sections Using the XY STAGE directional buttons on the Control Panel move the stage to the structure to be measured Open the Position Measurements window by scrolling down and highlighting Positions located under Measure in the Main Menu Position Measurements ee fak File Results Models C Using Field Alignment C Manual C Using Template 1 Set Up Relative Messe 63 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I TO proceed with a measurement file previously created in the MEASURE directory open up the Position Measurements File menu highlight Load and load desired file e The Model option is read from the file and switches on automatically e A Window will request to Point to the Reference Site relative to which all positions will be measured Point to 1st
43. exposure data from the EMU card and controls functions like position correction intensity and frequency correction while the ECU B counts X Y positions and controls the exposure timing DETC INTERFACE A multi channel ADC DAC and digital I O board used for sensors control signals and actuators e g the auto focus control interferometer initialization and the shutter IMAGE PROCESSOR The imaging system consists of two cameras of different resolutions a frame grabber an image processing board and a FIPS software package The BAB740 and its subsidiary board are controlling the latter parts 2 Stepper Motor and AF Control Rack In this rack all units controlling the motion of the system s stepper motors are to be found In addition it contains the autofocus control board which controls the position of the write lens using a pressure sensor signal to correct the position of the lens piezo actuators 3 AO Rack This rack contains the electronics for control of the acousto optic crystals The HF signal carrying the information for the laser beam positioning and intensity is generated here as well as the frequency ramp for the scanning of the beam 4 Power Unit Main power unit including the emergency shutdown relays and breakers 5 Anorad Controller Rack behind panel This rack controls the stage motion by linear motors 14 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I USER PC The user PC runs the Windo
44. gin was not previously set the Expose window offers several possibilities for choosing and setting the origin 47 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part e If the origin should be set in the center of the substrate the Find Center function can be used to detect the substrate edges using the autofocus and deducing the substrate center position from them CAUTION Be sure to focus near the plate center before starting the Find Center procedure e If the center position should be set in the stage center press Center Stage and then Set X 0 Y 0 e f coordinate angle and origin should be set according to alignment marks press Manual Align The manual global alignment procedure previously described will be started To check if the field alignment works correctly in all fields the Test Align button can be used Alignment results will be written to a report file To start an exposure press Expose Alternatively an automatic measurement sequence can be started by clicking on Measure All alignment results measurement results exposure commands and error are written to a report file in the job environment directory The Map window is continuously updated during an exposure While a field is exposed the User PC waits and displays how many stripes remain to be written for each field In case of an emergency pressing the BREAK button in the During Exposure window will interrupt the current exposure After Break is p
45. h if you do not follow instructions carefully HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Contact Should you need assistance please call Heidelberg Instruments during normal business hours CET Phone 49 6221 3430 0 Fax 49 6221 3430 30 or contact your local service office China Heidelberg Instruments China Rm 101 Block 1 Animation Park Yuehai Street Nanhai Road Nanshan Distr Shenzhen 518045 China Phone 86 755 8301599 1 2 7 Fax 86 755 8301599 4 Taiwan Heidelberg Instruments Taiwan 5F No 174 Chung Yang Road Hsinchu City Taiwan Phone 886 3531 1 304 284 Fax 886 35311 243 Korea Heidelberg Instruments Korea 316 Expo Officetel 381 Mannyeon dong Seo gu Deajeon 302 834 South Korea Phone 82 42 482 1668 Fax 82 42 482 1669 Japan Heidelberg Instruments Japan Germany Center for Industry amp Trade 1 18 2 Hakusan Midori ku Yokohama 226 0006 Japan Phone 81 45 938 5250 Fax 81 45 938 5251 USA Heidelberg Instruments Inc USA 2807 Oregon Court Unit E2 Torrance CA 90503 USA Phone 1 310 212 5071 Fax 1 310 212 5254 You can also reach Heidelberg Instruments via e mail himt himt de or visit our site on the Internet http www himt de HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CHAPTER 1 GETTING STARTED HEIDELBERG INSTRUMENTS DWL 66 fs DWL 66 SYSTEM FRAME ELECTRONICS USER PC INTRODUCTION The DWL 66Fs is
46. he Map file enter the positions of the field alignment sites relative to the respective field origin Parameters Alignment Site X and Alignment Site Y up to four sites with identical structures may be defined coordinates are then set apart by commas 7 Open Exposure window and perform a Test Align procedure to verify that all sites are found for all fields 8 Start second layer exposure 52 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Using Backside Alignment INTRODUCTION If the system is equiped with the backside alignment option exposures and measurements can be done in a defined position with respect to reference marks on the backside of the substrate using the backside alignment cameras All processes are identical apart from that the backside check has to be activated and the backside camera system has to be calibrated TESTING AND ADJUSTING BSA ACCURACY The testing and adjustment of overlay accuracy must be executed whenever a write head has been changed or removed for any reason since the last BSA adjustment Such a procedure serves to measure the write spot position with respect to the center of the backside monitor image which is the reference point for backside alignment An overlay pattern of a frame centered around a square should be used for the test As the thickness of the substrate is of importance in this calibration the procedure needs to be performed independently for different types of substrate
47. he do column Now you can enter a value for this field in the edit line at the top of the spredsheet The value entered here determines whether the Map field corresponding to this row is to be written DO COLUMN e Enter 1 if the flag is true and the field is to be written Enter 0 or leave the field empty if you want the field to be skipped 6 Click on the first row of the Ali column The value entered here determines the number of sites at which the prepared field alignment method is used ALI COLUMN Enter the value ALL No Alignment ALI 0 No Alignment ALl 1 One Site Alignment ALIl 2 Two Site Alignment ALI 3 Three Site Alignment ALA Four Site Alignment Multi site alignment can be used to increase alignment accuracy and control more coordinate system parameters 1 site control of field origin 2 or 3 sites correction of linear distortions in one axis two axes 4 sites rotational correction on top of global alignment 7 Click on the first row of the Xoff column This value determines the X offset in microns of the starting point of the exposure from the point that is determined from the Map geometry e The value may be negative and can have a decimal point 8 Click on the first row of the Yoff column This value determines the Y offset in microns of the starting point of the exposure from the point that is determined from Map geometry e The value may be negative and can have a decimal point
48. he system test pattern e Stitching X Measures the distance between two vertical lines on both left and right sides of a stripe border and will repeat the measurement in other locations on the substrate if required The RMS deviation of the results from the resulting average will determine stitching quality in X e Stitching Y Measures the vertical distance between the sections of two horizontal lines on both left and right sides of a stripe border and will repeat the measurement in other locations on the substrate if required The RMS deviation of the results from the resulting average will determine stitching quality in Y This value depends on the stage velocity and therefore must be minimized by optical adjustment for each configuration individually PITCH MEASUREMENTS The pitch measuring method is applied for finding the horizontal distance of two vertical lines or for finding the vertical distances of horizontal lines This method may be extended to measure whole sets of equidistant lines e Pitch X Compares the distance between two vertical lines or a row of equidistant lines over a programmed area 71 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Pitch Y Compares the distance between two horizontal lines or a row of equidistant lines over a programmed area EDGE MEASUREMENTS The measurement of edge roughness in an exposure the position of a horizontal or vertical edge is measured at a number of po
49. hich the calibration should take place Calibration range is limited to 90 so the structure may drift out of view Click on Calibrate button The stage will now be moved around the camera field and the position of the plate is measured using the defined template If manual mode is chosen the operator must manually point to the structure s edge or center at each measurement position Click on Calculate and the system will calculate the best fit Replace old calibration value with the new one by clicking on Replace Current Value Repeat full instruction for both axes and both cameras 76 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CHAPTER 4 ERRORS AND TROUBLESHOOTING Most problems that can occur result in an error message by the menu suggesting corrective action This section lists some additional common difficulties and offers possible explanations and solutions THE DWL WILL NOT IMAGE 1 2 3 Verify that the AC power cord is plugged into the wall outlet and that the outlet is receiving power Verify that the flowbox window is completely closed Try rebooting the OS9 system and the user PC LINES NOT TO SIZE Line thickness problems may have the following causes Developing technique time developer dilution etc not matched with material requirements Wrong resist thickness Focus height incorrect Incorrect exposure energy Out of date material fotosensitive coating developer
50. ion information field on the right side of the menu bar e A window with the available DWL 66 fs configuration files will appear UNI directional 100nm Pixel init_DWL u h10mm Bi directional 100nm Pixel init_DWL u h10mm BiDirScan ON gt gt gt gt gt gt gt gt 2 Change configuration according to the installed write head e g 10mm cfg for 10mm write head 23 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 3 If preparing for an exposure highlight the desired setup e g b w or grayscale if available 4 Press Load it button e The system will now reload the menu with the new configuration file and load the corresponding data sets on the system electronics Check Interferometer Status Before the stage can be initialized the interferometer status has to be checked by clicking on IF in the Main Menu e lf the label IF changes to IF OK proceed to the next section e lf IF FAIL appears then reset the Interferometer by clicking on IF R Reasons why the label might still read IF FAIL after a reset are e The machine was just switched on the interferometers need about 20 minutes to reach a stable state e The interferometer laserbeam is blocked Check for obstacles in the optical path NOTE The IF status label is only updated when the IF or IF R buttons are clicked 24 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Loading 1
51. ional angle and ask if the compensation should be executed 10 Repeat Steps 2 4 until the measured angle is satisfactory e Accept the last compensation then click Cancel in the Point to 17 Site window to complete the alignment sequence NOTE If tighter precision during a sequence is necessary simply switch to the micro camera using the Panel and use larger distances between the alignment sites It should be possible to align a substrate in accordance to the coordinate system within a few micro radians depending on the quality of the alignment sites and the resolution of the write lens 11 Click on Set 0 0 to set the origin according to next instruction or click on Exit to close the Manual Global Alignment window 30 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Setting the Origin INTRODUCTION For a successful exposure it is extremely important to have the origin of the coordinate system set to the correct location as required by the design i e center of the plate lower left corner of the plate etc ORIGIN INSTRUCTION There are two ways to set the origin The version using the Control Panel is comparatively coarse If a structure exists that can be used to define the center with higher precision the Set 0 0 sequence of the Manual Global Alignment window should be used Th Determine the position on the plate which the design requires as the coordinate origin Manual Globa
52. ites click on the Goto Site 1 and the Goto Site 2 buttons Set the Repeat Measurement times box to at least 5 for a good measurement Start the measurement by clicking on the Repeat Measurement button e When measurement is complete the distance between the two points will be shown in microns 61 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 10 When distance measurements are complete click Exit and return to the main menu window MEASUREMENTS USING A TEMPLATE INSTRUCTION 1 Load the DWL with the substrate to be measured as described in the Loading and Focusing sections Use the XY STAGE directional buttons on the Control Panel for moving the stage to the structures to be measured Open the Distance Measurements window by highlighting Distance located under Measure in the Main Menu Choose one of the templates offered in the Alignment field e If there are no templates click on the Make Template button e Foran explanation on how to define a template refer to User Guide Il Once a template is defined set the Repeat Measurement times box to at least 5 e The higher the value the more precise the measurement and the lower the value the less time measurement takes Start measurement by clicking on the Repeat Measurement button in the Distance Measurements window e When measurement is complete the distance between the two points will be shown in microns When distance measurements are compl
53. l Alignment Click on Set 0 0 The Point to Set to Zero window will appear If the write head is not already above the desired i use the Control Panel to move it there To open it click on the toolbar icon or in case of use of the Manual Global Alignment by clicking on Panel in the Point to Set to Zero window Move the stage with the XY STAGE directional buttons so that the nozzle gets above the desired coordinate origin a Control Panel version When nozzle is in its correct position click on the Set 0 0 button in the Control Panel e The present position is defined as the origin of the coordinate system b Manual Global Alignment version Close the Panel A crosshair will appear in the monitor Move the crosshair to the structure that defines the origin and click on OK e The system calulates the offest of the structure position from the image center and sets the current coordinates accordingly Note The Expose window discussed in the following chapter offers additional features for setting the origin 31 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Preparing Field Alignment Sequences METHOD 1 METHOD 2 Find XY Xw Yw Model FindX Xw Model Find w ModeD eege E EE anua 10 iy a ae System searches for a pre defined template in line or cross or a set of current image lines Model INTRODUCTION For overlay exposures as well as for automatic measurements it is important to
54. lation Guide for more details The following safety precautions should be observed when doors and covers are opened and the equipment is energized e Observe similiar electrical precautions as would be for any system consisting of 220 240 VAC dedicated circuit single phase power and DC power supplies e H access to the interior power of the system or any component is necessary while the system is in operation exercise extreme caution Only qualified service personnel should have access HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part System Components The DWL66fs system consists of the following main sub units e Granite System e Flowbox e Optics System e Electronic Control Units e User PC e Data processing conversion workstation GRANITE SYSTEM The DWL main system consists of a heavy granite construction Granite has been selected for its weight and stability These properties ensure a effective vibration isolation in connection with the air buffer system and b alow expansion coefficient In order to maintain an even expansion coefficient all other stage parts are constructed from granite as well Although this material has certain advantages granite is not completely insensitive to external influences Temperature and humidity play an important role in the stability of the machine therefore its external environment must be kept extremely stable The large volume of the granite results in a long adaptation perio
55. light Exposure Map located under Setup in the Main Menu The Exposure Map Design window will appear showing the settings of the current Map 37 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Exposure Map Design Field Width 10000 Field Height 10000 Alignment Site X 0 Alignment Site Y 0 Fields per Row 5 5 5 5 Fields Start at X 0 0 0 0 0 Field Zero 13 2 Click on the New button to create a map file without any values 3 During exposure each design will be exposed such that its origin falls onto the center of the map field or die it is exposed in Enter numbers according to sizes and desired positions of the design or designs that are to be exposed Field Zero 1 row jg A row 2 gt Alignment Site 500 14900 row 3 6 row As 6 row Ap 5 row 6 4 Fields per Row 4 5 6 6 5 4 Fields Start at X 145000 0 0 0 14500 14500 Alianment Site X 500 14000 LINE 1 Field Width e Enter desired width in micrometers e Value must be large enough for the design e If width is too small there will be overlapping LINE 2 Field Height e Enter desired height in micrometers e Value must be large enough for the design e If the height is too small there will be overlapping LINE 3 4 Alignment Site X Y e Distance of the alignment sites to the origin of the die e Up to four alignment sites can be entered separated by commas 38 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide
56. lsion plates and films 40mm Used for low resolution emulsion plates and films The customer when adapting a system to a unique application can exchange any lens An air gauge auto focus system is used to correct for variations in the glass plate thickness by moving the lens accordingly with a piezo CAUTION e Make sure that the nozzle of the air gauge autofocus system never touches the substrate or the stage e When handling a dismounted write head take care not to scratch or dent the nozzle 11 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I e CAMERA UNIT The camera unit optics comprises a micro camera a macro camera and a white light illumination Such a unit can be used to inspect and measure plates and films For multi layer applications the cameras are also employed for alignment The cameras are connected to a video image processing system offering a number of metrology functions see chapter three e BACKSIDE ALIGNMENT CAMERA UNIT One of the options for the DWLE66Fs is the capability for alignment to a structure on the backside of a substrate The backside alignment camera unit comprises the same components as the standard camera unit plus a focusing objective e INTERFEROMETER Only industry standard interferometer systems with proven qualifications are being utilized A stage position measurement device provides the necessary information for the online position error correction system Only th
57. measurement the average value is displayed 13 To view measurement results click on the Results menu in the Line Width Measurements window and highlight View and Save e An editor displays the results which may be saved 14 Scroll down and highlight To Excel located under the Result menu in the Line Width Measurements window to view results on a Microsoft Excel spreadsheet e Highlighting To Excel will copy the results into the Clipboard e Start Microsoft Excel and load data into a spreadsheet by pressing CTRL V or by using the Paste function e All data processing options that Microsoft Excel offers are available e When spreadsheet results are complete return to the Line Width Measurements window 15 Click Exit to return to the main menu window 70 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Pitch and Stitching INTRODUCTION In many cases it is important to measure the distance between two structures located relatively near to each other If such structures are identical in appearance the distance being measured or pitch is uniquely defined by a numerical comparison of the two video profiles of each structure A cross correlation will yield the pitch with an extremely high repeatability MODELS STITCHING MEASUREMENTS Determines the vertical distance of two horizontal lines or the horizontal distance of two vertical lines and is designed to run DWL stitching performance measurements in both X and in Y using t
58. o set up a new measurement file choose one of the four models Large Box in Box X Performs measurement previously described above in the X direction Large Box in Box Y Performs measurement previously described above in the Y direction Box in Box XY Model Actually Small Box in Box Model Performs measurement previously described above measuring x and y overlay quality at the same time Box in Box XY Model2 Actually Small Box in Box Model Performs measurement previously described above and is especially designed for low contrast designs and structures covered by a resist layer Click on the Set Up button to setup measurement program Depending on which model was selected the Define Box window appears requesting that measurement frames be placed over the structure After the measurement procedure is set up click on Cancel to close the Define Measurement window To save the measurement program select a reference point 58 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I e lf a reference point is not selected the program will simply save the current stage position as the reference point e To define a reference point click on the Relative To button e For a local series of measurements the location of the first structure is usually chosen as the reference point e When preparing a method for a fully automatic measurement procedure the field alignment site can be used 10 Save measurement
59. or best contrast Highlight Field Alignment Method under Setup in the main menu e The following window will open Field Alignment Macros Empty the list of all entries by pressing Cut repeatedly Transfer the current camera settings to the edit line by pressing Cam press Enter on the keyboard to transfer this line to the command macro list Press Next to continue with the next command line From the selection box upper right corner of the Field Alignment Macros window choose the command delay and press Use e Enter the number of seconds the system should wait after a movement before the alignment sequence starts 34 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part e Press Enter on the keyboard to transfer the command to the list 9 Proceed to the next line and choose an alignment function from the list e Find XY Pos XY Detect a cross see Simple Cross Alignment e Find Manual Structure must be marked manually by the operator e Find Template Structure is detected by comparison with a predefined template e Find X Find Y Detect horizontal vertical lines if both are used successively with a possible movement in between the position of the point where the lines would cross is the result of the alignment procedure 10 Repeat the alignment function if a higher precision is necessary 3 repetitions recommended 11 Test sequence by pressing the Test button For more in depth explanations of the alignment func
60. program by highlighting Save Measurement located under the File menu in the Overlay Measurements window e Incase a reference site has never been marked a window will appear notifying the fact and asking if the method should be saved anyway 11 Start measurement by clicking on the Measure button and continue the measurement until enough data is collected e A result window shows the updated values e After the measurement the average value is displayed 12 To view measurement results click on the Results menu in the Overlay Measurements window and highlight View and Save e An editor displays the results which may be saved by highlighting Save As under File in the Overlay Measurements window 13 Scroll down and highlight To Excel located under the Result menu in the Overlay Measurements window to view results on a Microsoft Excel spreadsheet e Highlighting To Excel will copy the results into the Clipboard e Start Microsoft Excel and load data into a spreadsheet by pressing CTRL V or by using the Paste function e All data processing options that Microsoft Excel offers are available e When spreadsheet results are complete return to the Overlay Measurements window 14 Click Exit to return to the main menu window 59 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part Distance Measurements INTRODUCTION The Distance Measurements program is designed for the measurement of distances between structures on a substrate A
61. ressed the current stripe will finish and all processes necessary for completing an exposure will be stopped NOTE Do not press the Expose button until everything is setup correctly i e the Make Job file is correct the write head is in correct position etc NOTE Make sure system is focused Once exposure is finished click Unload button e Write head will move up while the stage moves to the unload position The Edit Report button allows for the test exposure report to be viewed and saved under a different name Note The menu always stores reports for the same job under the identical name To preserve a report for later use it is important to rename it 48 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part OPTIONS o AUTO UNLOAD If checked the Unload function will be executed automatically after the exposure is finished o JOB LOG If checked the name of the exposure measurement job environment is entered into a list followed by the first design name or measurement file name encountered Next both start time and date and stop time and date are listed and this information is entered into the file JOBLOG TXT which can be found under C VBMENU WINDWL o LASER OFF only available in systems with externally controllable laser This will lead to an automatical shutdown of the laser after an exposure is finished o DEBUG If continuous problem occur with a specific job the debug mode c
62. rough this function will a machine be able to achieve its required level of precision X Interferometer including receiver AF Se Ge e SS G ER o g 2 8 Kal a amp 12 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I CAUTION Never interrupt any of the interferometer laser beams since this causes the loss of position information and during movement will cause the stage to stop immediately If beams were interrupted the interferometer must be reinitialized before machine operation may be resumed Do not touch the mirror surfaces Touching a mirror surface with bare hands will damage it beyond repair 13 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I ELECTRONIC CONTROL UNITS The electronic control of the DWL 66 fs consists of five main parts positioned in separate slots of the electronics control rack 1 System Control Rack The system control rack contains all control units for data processing and positioning Central units are MAIN PROCESSOR BAB740 A 68030 Motorola processor running under a multitasking OS9 operating system controls the subprocessors for stage positioning pixel generation and image alignment via a VME bus The main CPU board also contains the connection to the ethernet network EXPOSURE MEMORY UNIT EMU A card controlling 1MB of 16 bit SRAM modules for processing exposure data EXPOSURE CONTROL UNITS ECU The ECU A2S unit gets
63. s 1 Expose reference marks on top of a photoresist coated substrate and etch this pattern 2 Coat the backside of the substrate with photoresist 3 Flip substrate so that the reference marks are on the bottom side and the resist coated side is on the top 4 Align along y axis with a BSA camera using the Manual Alignment function 5 Set one of the alignment marks as reference point and expose the square 6 Rotate substrate by 180 degree and align the y axis again with the same backside camera Set the same alignment mark as reference point as before and expose the frame 7 Develop pattern 8 Measure the misalignment of the overlay pattern The calibration offset is half the misalignment of each axis 9 Enter the offsets gained from the measurement into the menu configuration file by adding it to the values given for XBEAMBS and YBEAMBS and repeat procedure until a good match is reached 53 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CHAPTER 3 HOW TO DO METROLOGY INTRODUCTION A number of measurement procedures to quantify exposures are listed under Measure in the main menu Some of these commands are specifically developed to aid with the measurement of parameters important for system specific adjustments and calibrations Most metrology commands require top illumination which will lower quality measurement of emulsion plates if using the high magnification objectives with 4mm and 10mm focal lengths e
64. s the distance between the two minima The location of the extrema is found by locally fitting a parabola NOTE There are several ways to define the line width meaning that obtained values are only useful for comparing line widths The values are not correct on an absolute scale If the absolute values are necessary an offset must be defined using a calibration standard LINEWIDTH MEASUREMENT INSTRUCTION 1 Load the DWL with the substrate to be measured as described in the Loading and Focusing sections Using the XY STAGE directional buttons on the Control Panel move the stage to the line or circle structure to be measured Open the Line Width Measurements window by scrolling down and highlighting Linewidth located under Measure in the Main Menu Line Width Measurements l O xj File Results Model r Properties re Linewidth x C Inside Threshold 50 E C LineWidth C Outside m Thick LineWidth4 GG Minimum Repeats 1 SS C Thick LineWidth y ae Relative To Measure Exit To proceed with a measurement file previously created in the MEASURE directory open up the Line Width Measurements File menu highlight Load and load desired file e The Model option is read from the file and switches on automatically e A Window will request to Point to the Reference Site relative to which all positions will be measured 68 HEIDELBERG INSTRUMENTS DWL G6Fs User Guid
65. saved anyway 11 To view measurement results click on the Results menu in the Position Measurements window and highlight View and Save e An editor displays and will save the results 12 Scroll down and highlight To Excel located under the Result menu in the Position Measurements window to view results on a Microsoft Excel spreadsheet e Highlighting To Excel will copy the results into the Clipboard e Start Microsoft Excel and load data into a spreadsheet by pressing CTRL V or by using the Paste function e All data processing options that Microsoft Excel offers are available e When spreadsheet results are complete return to the Position Measurements window 13 Click Exit to return to the main menu window 65 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Linewidth Measurements INTRODUCTION The line width measurement program allows line widths in the X and Y direction as well as circle diameters to be measured In order to achieve the most precise results modify Lamp Gain and Offset parameters of the camera in the Control Panel to optimize the contrast of the image As shown in the figure on the right a box is to be defined across the line The pixels belonging to the line structure are summed up vertically which results in a curve with a variation in X A fit is performed on the curve and the fitted curve is normalized VIDEO PROFILE 100 In the Figure shown on the left the line width is determined by finding
66. side alignment capability FS stands for the front side camera system BS for the backside system 3 Close the Control Panel by clicking on Exit 4 Click on the Manual Global Alignment button in the toolbar 5 Systems with backside alignment only H the alignment should be performed using structures on the back side click on the BS check checkbox If the box is unchecked alignment will be performed using the top side 6 Choose whether alignment is to be performed along the X or along the Y axis 7 Point camera cursor to the first alignment site on the substrate using the manual alignment window and click OK If the site is not on the screen click on Panel and use the Control Panel functions to move the structure into the camera field using the XY STAGE directional buttons For reference on other control panel functions that can be used for stage movement see User Guide Il 8 Point camera cursor to the second alignment site on the substrate along the axis chosen for alignment and click OK If the site is not on the screen click on Panel and use the Control Panel to move the structure into the camera field 29 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part 9 The system will calculate the angle of rotation between the two points e The rotation will be compensated by a computational rotation of the stage coordinate system e After calculation of the rotation a dialogue box will appear showing the calculated rotat
67. sitions along the edge The RMS deviation of a fit through these position measurement results will determine edge roughness Edge X Determines the roughness of a vertical edge due to position fluctuations No other structures may be close to the edge Edge Y Determines the roughness of a horizontal edge due to position fluctuations No other structures may be close to the edge OTHER APPLICATIONS Scan Linearity If Scan Linearity is measured a series of pitch measurements are applied to successive positions in the linearity measurement area of the DWL PERFORMANCE PATTERN The RMS deviation of the average becomes the scan linearity quality PITCH MEASUREMENTS INSTRUCTION 1 Load the DWL with the substrate to be measured as described in the Loading and Focusing sections 2 Using the XY STAGE directional buttons on the Control Panel move the stage to the first line to be measured 3 Open the Pitch Measurements window by scrolling down and highlighting Pitch Stitching Edge Positions located under Measure in the Main Menu 72 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I pw Pitch Measurements File Results C Stitching X Pitch X Edge X C Stitching Y Pitch Y Edge Y To proceed with a measurement file previously created in the MEASURE directory open up the Pitch Measurements File menu highlight Load and load desired file e The Model option is read from the file and s
68. system is working properly by pushing the plate sideways e lf the plate can be moved there is an air leak and suction must be improved by pressing the plate down carefully onto the chuck CAUTION Do not touch the resist on areas to be exposed 12 If after pressing down on the plate it is still not held down tightly check the surfaces again for dirt or scratches e f necessary try a new plate 27 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Focusing 1 Open the Control Panel either by clicking on the toolbar icon by typing the F9 function key or by choosing on DWL Control Panel under Service in the Main Menu W DWL Control Panel File Options Stage StepSize Positions View FOCUS Z2 0 Steps C Step R 0 mrad C Field FOC 0 eg de FS Micro Cam Lmp Gn Off 2 Click on the INIT button D The system will center the stage e lf the plate was placed in the center of the stage during loading it is now centered below the write head as well e H not you should move the center of the plate manually below the write head using the XY STAGE control buttons 3 Click on the FOCUS button VC CAUTION Before clicking on the FOCUS button always make sure the NOTE NOTE substrate is under the writehead f the system focuses on anything else but the substrate the nozzle is liable to crash The FOCUS button is also available in the Expose window
69. tions or template definition see User Guide PART II Reference Manual NOTE A field alignment sequence should be tested thoroughly in different portions of the plate before it is used for overlay exposures or measurements Besides testing the alignment sequence from the Field Alignment Macros window it is also possible to start a full alignment test run for all fields where alignment has been set to 1 in the Job file by pressing the Test Align button in the Exposure window see previous section Highlighting Analyse Report for Alignment Results under Tools in the main menu will allow for the viewing of test results or the number of alignment sites given in the map 35 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part CHAPTER 3 HOW TO DO EXPOSURES INTRODUCTION For exposures and automatic measurement sequences the DWL requires several job dependent data files e Map File map containing information on positioning e Job File dwl containing data in which map fields which tasks should be performed and under what conditions e Field Alignment File fa containing a sequence for coordinate alignment to existing structures All files for one project including report files have to be located in the same directory This set of files defines a Job Environment JOB AND MAP FILE DIRECTORY STRUCTURE Field Arrangement Expose Control Field Alignment Macros Once such an environment has b
70. ton and continue the measurement until enough data is collected e For Pitch Measurements the first distance measured will be used as default and only the first box will have to be placed for every succeeding measurement e A result window shows the updated values e After the measurement the average value is displayed 12 To view measurement results click on the Results menu in the Pitch Measurements window and highlight View and Save e An editor displays the results which may be saved 13 Scroll down and highlight To Excel located under the Result menu in the Pitch Measurements window to view results on a Microsoft Excel spreadsheet e Highlighting To Excel will copy the results into the Clipboard e Start Microsoft Excel and load data into a spreadsheet by pressing CTRL V or by using the Paste function e All data processing options that Microsoft Excel offers are available e When spreadsheet results are complete return to the Pitch Measurements window 14 Click Exit to return to the main menu window 74 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I Camera Calibration Camera Calibration x m Current Calibration Macro X 39 696 Micro X 8 673 Macro Y 38 797 Micro Y 8 408 Method Orientation Ce Manual Ce X axis Use Template 1 E Y axis Use Line Fit Screen Size X 0 um CAMERA Macro Screen Size Y 0 um Number of Points 10 FitRange 50 S Calibrate Make Template Calculat
71. witches on automatically e A Window will request to Point to the Reference Site relative to which all positions will be measured Point to 1st Site ES 0 e Once file is loaded proceed directly to Step 11 To set up a new measurement file choose one of the Methods described above for a measurement in the X or in the Y direction Click on the Set Up button to setup measurement program Depending on which model was selected the Define Box window appears requesting that measurement frames be placed over the structure s After the program is set up click on Cancel to close the Define Box window To save the measurement program select a reference point e lf a reference point is not selected the program will simply save the current position as the reference point 73 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part e To define a reference point click on the Relative To button e For a local series of measurements the location of the first structure is usually chosen as the reference point e When preparing a method including a fully automatic program the field alignment site can be used 10 Save measurement program by highlighting Save Measurement located under the File menu in the Pitch Measurements window e Incase a reference site has never been marked a window will appear notifying the fact and asking if the method should be saved anyway 11 Start measurement by clicking on the Measure but
72. ws User Menu converting user input into DWL commands and thus controlling functions of the DWL 66 fs The User PC is a tool for making the DWL 66 fs easier to operate by minimizing handling errors DWL66 Heidelberg Instruments File Job Setup Measure Tools Service Laser Help E 7 Job File DWL ME 151 Field Ali MAPNAMEFA E LIF OK UG JLIER l Map File MAPNAMEMAP The DWL 66 fs User Menu provides instant access to main functions via the control toolbar Opens Control Panel for movement focussing camera settings etc Opens current Exposure Map Starts a preprogrammed Manual Global Plate Alignment Sequence Hew Opens Mini terminal window for login and limited communication with the OS9 system 7 Request Interferometer status kk NOTE The status shown in the label ee will only update when this button is pressed 7 J Resets Interferometer NOTE IF R also forces a stage reset Configuration file in use double click to change configuration see Chapter 2 Section Changing write head and Exposure Mode 15 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part The main menu offers a number of logical menus File Contains the functions necessary to inspect which data files are available on the machine s hard disk Job Exposure conditions and data sets of an Exposure Job are modified using the commands in this menu A prepared job may be opened for use or modification
73. x method 55 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part LARGE BOX IN BOX METHOD REQUIRED PATTERN Part of the HIMT test pattern may be used A frame is written to a first layer e g PFMXX_AX LARGE BOX in BOX A second frame with equal line thickness but of a different size is written onto the second layer PFMXX_BX over the first layer Ideally the centers of the two squares coincide L aaa Overlay X Pitch 1 Fitch 2 How well the two layers actually do coincide is Overlay Y Pitch 3 Pitch 4 determined by the Overlay Measurements program MEASUREMENT PROCEDURE Four fields must be defined as shown in the Large Box in Box figure above Within each of the four fields the pitch between the two lines is measured e For the overlay measurement in the X direction the pitch measurements of the fields 1 and 2 are compared e For the Y direction the pitch measurement of the fields 3 and 4 are compared The overlay error in x and y is then calculated from the difference between the X and Y pitches respectively e The Large Box in Box structure is usually larger than the micro camera field The system therefore must measure the fields sequentially and centers each one on the screen before doing a pitch measurement 56 HEIDELBERG INSTRUMENTS DWL 66Fs User Guide Part I SMALL BOX IN BOX METHOD REQUIRED PATTERN SMALL BOX in BOX The Small Box in Box structure consists of two patt

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